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Compact engraving machine / jewellery - M10 Jewel
The M10Jewel manufactured by Gravograph is an engraving device that has been developed to provide effective, and reliable, and eye-catching quality performance while operating quietly specifically...
Compact engraving machine / jewellery - M10 Jewel
The M10Jewel manufactured by Gravograph is an engraving device that has been developed to provide effective, and reliable, and eye-catching quality performance while operating quietly specifically for internal and external engraving applications for bracelets, bangles, rings, and wedding bands. Its compact, robust, lightweight and minimal footprint design is constructed out of durable materials for a long life service.
The device is portable and can be used in shops, boutiques, trade fairs, workshops, and even in the market place. It is integrated with the GravoStyle™ Explorer level which is compatible for computers that utilizes Windows interface. It includes fonts, symbols and designs which it can engrave on precious metals.
The device is portable and can be used in shops, boutiques, trade fairs, workshops, and even in the market place. It is integrated with the GravoStyle™ Explorer level which is compatible for computers that utilizes Windows interface. It includes fonts, symbols and designs which it can engrave on precious metals.
Photo engraving machine / jewellery - 100 x 100 mm | M20 Pix
The M20Pix is a mechanical photo and text engraver. The mechanical engraver has an integrated laser pointer which makes it easy of tasks...
Photo engraving machine / jewellery - 100 x 100 mm | M20 Pix
The M20Pix is a mechanical photo and text engraver. The mechanical engraver has an integrated laser pointer which makes it easy of tasks to be simulated. The engraving itself is automatic and uses a strong and durable tip made of diamond to guarantee a precise, above average and long lasting engraving. The uncomplicated design features an easy positioning of the image and text on the object to engrave. Other than the engraving machine with diamond marking technology, a QuikPix software and accessories are also included in the pack.
Compact engraving machine / for plastics / for metals - 305 x 210 mm | M40ABC
Computerised engraving as simple as it gets.
As simple as ABC.
The M40ABC is Gravographs easiest machine to operate yet. Operated via a TouchPad interface using a simplified, purpose designed engraving software. No PC required,...
As simple as ABC.
The M40ABC is Gravographs easiest machine to operate yet. Operated via a TouchPad interface using a simplified, purpose designed engraving software. No PC required,...
Compact engraving machine / for plastics / for metals - 305 x 210 mm | M40ABC
Computerised engraving as simple as it gets.
As simple as ABC.
The M40ABC is Gravographs easiest machine to operate yet. Operated via a TouchPad interface using a simplified, purpose designed engraving software. No PC required,...
As simple as ABC.
The M40ABC is Gravographs easiest machine to operate yet. Operated via a TouchPad interface using a simplified, purpose designed engraving software. No PC required,...
ECR plasma engraving system / for silicone - M-8000 Series
The M-8000 series has been optimized for sturdy mask and silicon etching for 32 nm and beyond as its operation has been enhanced...
ECR plasma engraving system / for silicone - M-8000 Series
The M-8000 series has been optimized for sturdy mask and silicon etching for 32 nm and beyond as its operation has been enhanced coming up with new material etch process like high-k dielectric or metal gate via JDPs along with the supplier of material and makers of the device.
This system can easily be controlled and CD uniformity inside a chamber that merge the ECR plasma source, rapid wafer temperature control and high vacuum exhaust technology. The applicable wafer diameter is 300mm.
This system can easily be controlled and CD uniformity inside a chamber that merge the ECR plasma source, rapid wafer temperature control and high vacuum exhaust technology. The applicable wafer diameter is 300mm.
ECR plasma engraving system / for silicone - M-6000 Series
M-600/6000 conductor etch system provides functional solution for power devices that requires silicon...
ECR plasma engraving system / for silicone - M-6000 Series
M-600/6000 conductor etch system provides functional solution for power devices that requires silicon element removal on trenches for mobile workstations, domestic electrical fixtures, automobiles, trains, and the like. It adapts a low-temperature mechanism and TM bias technology with electron cyclotron resonance plasma of high density composition, which enables neat processing and stellar trench profiles.
EMCP plasma engraving system / for non-volatile materials - ø 150 - 300 mm
The next generation memories supported by this product include MRAM (*3) and FeRAM (*4), which require etching novel,...
EMCP plasma engraving system / for non-volatile materials - ø 150 - 300 mm
The next generation memories supported by this product include MRAM (*3) and FeRAM (*4), which require etching novel, non-volatile materials. The adhesive byproducts located inside the etch chamber often lead to significant loss of productivity when it comes to the production of volume.
The item is known to provide an outstanding solution to this problem by guaranteeing constant high performance, even for non-volatile material etches.
The item is known to provide an outstanding solution to this problem by guaranteeing constant high performance, even for non-volatile material etches.
EMCP plasma engraving system / for non-volatile materials - ø 150 - 200 mm
In order to achieve rapid increases of aerial densities of HDD, advanced patterning solutions are required for thin film...
EMCP plasma engraving system / for non-volatile materials - ø 150 - 200 mm
In order to achieve rapid increases of aerial densities of HDD, advanced patterning solutions are required for thin film head production. Because of this, the leading-edge semiconductor processes are regarded as a breakthrough of the HDD industry.
This EMCP etch system is able to provide superior performance when it comes to profile control, along with superior etching rates and greater selectivity, when compared to ion-milling processes of traditional type.
This EMCP etch system is able to provide superior performance when it comes to profile control, along with superior etching rates and greater selectivity, when compared to ion-milling processes of traditional type.
VHF plasma engraving system / for oxides - U-8250
The high-tech U-8250 by Hitachi offers high-speed etching for holes defined by a high aspect ratio and makes use of a VHF plasma source, with an electrical dissociation efficiency. The...
VHF plasma engraving system / for oxides - U-8250
The high-tech U-8250 by Hitachi offers high-speed etching for holes defined by a high aspect ratio and makes use of a VHF plasma source, with an electrical dissociation efficiency. The...